Simulation-Based Analysis of Ultra Thin-Body Double Gate Ferroelectric TFET for an Enhanced Electric Performance

نویسندگان

چکیده

The ultra thin body double gate FE layer TFET (UTB-DG-FE-TFET) is proposed and investigated in this work. Electrical performance parameters such as surface potential ? (x), electrical field, drain current, sub-threshold swing, threshold voltage, Ion/Ioff ratio are further analyzed using simulation-based analysis. Integration of Si: HFO2 ferroelectric on top bottom surfaces make the structure that provides negative capacitance, higher enormous potential, peak electric improvement SS with degradation off Current. suggested design evaluated comparison FE-TFET standard structures. Finally, impact device geometry variants like thickness (tfe), intrinsic channel tsi, interfacial types, (tox) length Lc transfer characteristics through 2D TCAD Sentaurus Simulator for a clear validation its optimization. recommended work demonstrates it suitable enabling superior helpful ultra-low-power applications.

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ژورنال

عنوان ژورنال: Silicon

سال: 2021

ISSN: ['1876-9918', '1876-990X']

DOI: https://doi.org/10.1007/s12633-021-01428-2